Nitride and oxide film deposition in high density plasma of a radio frequency plasma generator
The process of composite films deposition, with simultaneous control of their quality, requires implementation of various a complex devices. Besides, in the case of optical films deposition, a very stable process without impurities via very long time is required.
A novel radio frequency induction plasma source generator, is developed by "Laboratory of vacuum technologies, Itd", to fit requirements of long term stable operation, without
contamination of the generated plasma by electrode's material.