Beams and Plasmas Co.
We develop |
About Beams & Plasmas
Laboratory of Vacuum Technologies (Beams&Plasmas™) is an advanced, rapidly developing company from Zelenograd. We develop vacuum equipment for coating deposition. State-of-the-art technical concepts, high reliability and capacity, as well as reasonable prices and compact sizes are distinguishing features of our machines.
What we do
  • Vacuum process units for industrial and research applications intended for surface coating and ion-plasma surface treatment.
    They provide a number of versions easily customizable for specific industrial or research tasks. Fully automated control.
  • Vacuum systems process equipment (magnetrons, ion sources, plasma generators, vacuum system matching units, sensors and accessories).
  • Engineering advice.
  • Maintenance and repair of vacuum equipment.
  • Modernization of the existing vacuum process equipment.
    and more
Technology
Ion-plasma technologies has many applications in various technical fields:

  • Production of microcircuits using hybrid technology, semiconductor devices and integrated circuits, MEMS, LED, coating on turbine blades and much more
  • Magnetron sputtering of metals, alloys, semiconductors and dielectrics, including high rate magnetron sputtering of metals such as Cu, Sn, In, Ag and other (in their own magnetron pairs)
  • Reactive magnetron sputtering of metal targets and various semiconductor materials, such as: SiO2, Si3N4, TiO2, TiN, ITO, ZnO, Al2O3, AlN, MgO, Ta2O5, TaN, etc.
  • Ion-beam and ion plasma substrate cleaning before deposition including hydrogen or oxygen plasma or atomic hydrogen
  • Ion-beam and ion-plasma assisted deposition (for various technologies)
  • Ion-plasma nitriding and carbonitriding
  • Plasma-enhanced chemical vapor deposition of dielectrics - PECVD - (SiO2, Si3N4, mono- and polysilicone, GaAs, GaN, photoresist, and polyimide)
  • Electron-beam melting and refining of metals
  • Modernization of the existing vacuum process equipment for the implementation of ion-plasma technologies
Our equipment
Core team
The smartest people work every day
to provide the best service
Eugene Berlin
Chief Designer
  • Development of vacuum physical vapor deposition equipment and plasma enhanced chemical vapor deposition equipment, technological components and processes
  • Designer vacuum technological systems of MESH series, Caroline series, Nika series
  • Total amount of vacuum systems produced is over 300
  • Author of 4 books, over 40 articles and 7 patents
Vasily Grigoriev
Deputy Director for R&D
  • Big experience in leading R&D in physical vapor deposition and plasma technologies
  • Development of vacuum equipment, technological components and processes for coating deposition, surface plasma modification, ionic and plasma-chemical etching and deposition
  • Author of over 20 articles and 2 patents
Eugene Silkin
Managing Director
  • Over 15 years of experience in industrial and business management
  • Over 15 years of experience in investing in technological projects
Yaroslav Korolenko
CEO
  • Established laboratory of vacuum coating technologies
  • Completed investment projects with total value of over than $ 2M
Books
Obtaining thin films by reactive magnetron sputtering

Berlin Evgeny
Seidman Lev
The book is a detailed reference guide to the basics of physical, technological features and practical application of reactive magnetron deposition of thin films of complex composition such as chemical compounds of metals or semiconductors with nitrogen, oxygen or carbon. It is a detailed description of the physical processes occurring during reactive magnetron sputtering and its technological features. Particular attention is paid to methods of process control reactive magnetron deposition of thin films which provide the stability and reproducibility of both the coating process and the properties of the resulting films.
The ion-plasma processes in thin-film technology

Berlin Evgeny
Seidman Lev
This book is a comprehensive reference guide to the main vacuum plasma chemical processes in thin-film technology such as reactive magnetron thin film deposition and ion-plasma etching. The book contains a detailed description of magnetron sputtering systems and plasma chemical etching systems for thin films, the technological features of their use.
The plasma thermochemical surface treatment of steel parts

Berlin Evgeny
Koval Nikolai
Seidman Lev
The book is a comprehensive reference guide to the basics of plasma thermochemical surface treatment of steel parts. The book analyzes types of equipment and its design principles to achieve high performance and uniformity of treatment, variants plasma thermochemical processing.
Vacuum technology and equipment for coating and etching of thin films

Berlin Evgeny
Dvinin Sergei
Seidman Lev
The book summarizes the current state of one of the branches of the manufacturing of electronic equipment technology vacuum deposition and etching of thin films. The book contains a detailed description of magnetron sputtering systems, plasma chemical etching systems for thin film and the technological features of their use. It includes mathematical models, management methods and examples of reactive magnetron sputtering, the principles of construction and application of mid-range power supply for the reactive magnetron sputtering.
Papers
Advanced plasma source for dense plasma generation
Plasma sources are widely used in different plasma-assisted processes, which are surface modification and cleaning, ion assisted deposition and many others. Most plasma sources
are based on discharges, that require electrodes immersed into plasma. These elements interact with plasma and may be eroded or coated with dielectrics. To protect plasma from
an influence of erosion products of the electrodes, additional technical methods are needed, thereby increasing complexity of the plasma source.

In microelectronics production the influence of impurities on a product is devastating, so requirements to plasma sources were very strict from the very beginning. Evolution of
plasma sources for plasma chemical reactors led to utilization of electrodeless discharges. Induction discharges operates with frequencies (1-100 MHz) and are able to provide generation of plasma with density up to 1012 ion/cm3 and ion price down to 100-120 eV/ion. But some requirements that are essential for microelectronics industry such as a uniform distribution of plasma density and composition on the large diameters (200 – 300 mm), are not so important for process in other fields, e. g. steel nitriding.
Nitride and oxide film deposition in high density plasma of a radio frequency plasma generator
The process of composite films deposition, with simultaneous control of their quality, requires implementation of various a complex devices. Besides, in the case of optical films deposition, a very stable process without impurities via very long time is required.

A novel radio frequency induction plasma source generator, is developed by "Laboratory of vacuum technologies, Itd", to fit requirements of long term stable operation, without
contamination of the generated plasma by electrode's material.
Two-dimensional plasma density distributions in low-pressure gas discharges
The plasma density distribution in a two-dimensional nonuniform positive column of a low-pressure gas discharge is studied in the hydrodynamic approximation with allowance for ion inertia. Exact solutions are derived for discharges in a rectangular and a cylindrical chamber. Asymptotic solutions near the coordinate origin and near the critical surface are considered. It is shown that, for potential plasma flows, the flow velocity component normal to the plasma boundary is equal to the ion acoustic velocity. The results obtained can be used to analyze the processes occurring in low-pressure plasmochemical reactors.
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